SCOPUS 정보 검색 플랫폼

Applied Physics Letters

Volumn 84, Issue 17, 2004, Pages 3292-3294

Full silicidation process for making CoSi2 on SiO2

(5) Zhao, Q T a Rije, E a Lenk, St a Bay, H a Mantl, S a

a NONE

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; MICROSTRUCTURE; MOLECULAR BEAM EPITAXY; MOSFET DEVICES; NUCLEATION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SEMICONDUCTOR MATERIALS; SILICA; SILICON WAFERS; THERMAL EFFECTS; THICKNESS MEASUREMENT; TRANSMISSION ELECTRON MICROSCOPY;

CROSS-SECTIONAL TRANSMISSION MICROSCOPE (XTEM); RAPID THERMAL PROCESSING (RTP); SILICIDATION;

COBALT COMPOUNDS;

EID: 2542446390 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.1728299 Document Type: Article

Times cited : (8)

References (7)

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