Standard cell printability grading and hot spot detection

Proceedings - International Symposium on Quality Electronic Design, ISQED

Volumn , Issue , 2005, Pages 264-269

  Cote, Michel ^a   Hurat, Philippe ^a  

^a SYNOPSYS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

HOT SPOT DETECTION; PARADIGM SHIFTS; PARTICLE CONTAMINATION; PARTICLE DENSITIES; PROCESS CONDITION; PROCESS TECHNOLOGIES; RANDOM PARTICLES; SYSTEMATIC DEFECTS;

DESIGN; ELECTRIC BATTERIES; OPTIMIZATION; SILICON;

GRADING;

EID: 84886669624     PISSN: 19483287     EISSN: 19483295     Source Type: Conference Proceeding    
DOI: 10.1109/ISQED.2005.113     Document Type: Conference Paper

References (4)

1. IBS May 2004 Newsletter (Design for Manufacturability)
2. M. Cote, and P. Hurat, "Layout Printability Optimization using a Silicon Simulation Methodology", ISQED 2004.
3. Luigi Capodieci, "Manufacturability Metrics and RET Tradeoffs For Physical Design and Layout", Electronic Design Processes 2003
4. Hua-Yu Liu, Linard Karlin, Yao-Ting Wang, Y. C. Pati, "The Application of Alternating Phase-Shifting Masks to 140 nm Gate Patterning: Line Width Control Improvements and Design Optimization", SPIE 1