Comprehensive modeling of near-field nano-patterning

Optics Express

Volumn 13, Issue 18, 2005, Pages 7198-7208

  Rumpf, Raymond C ^a   Johnson, Eric G ^a  

^a UNIVERSITY OF CENTRAL FLORIDA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

LIGHT POLARIZATION; LITHOGRAPHY; MATHEMATICAL MODELS; SPECTRUM ANALYSIS;

INTENSITY-THRESHOLD METHODS; NEAR-FIELD NANO-PATTERNING; UV LAMPS;

NANOSTRUCTURED MATERIALS;

EID: 24944538458     PISSN: 10944087     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OPEX.13.007198     Document Type: Article

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