Formation of ultrathin SixNy layers on silicon utilizing PECVD

Journal of Non-Crystalline Solids

Volumn 351, Issue 37-39, 2005, Pages 3006-3012

  Guo, Ruofeng ^a   Kurata, Y ^a   Inokuma, T ^a   Hasegawa, S ^a  

^a KANAZAWA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION EFFECTS; CORRELATION THEORY; CRYSTALLINE MATERIALS; ELECTRON RESONANCE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; NITRIDES; PARAMAGNETIC RESONANCE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; ULTRATHIN FILMS;

ATOMIC DENSITIES; NITRIDATION TEMPERATURE; SPECTRAL INTENSITY; SPIN DENSITY;

SILICON;

EID: 24944505509     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2005.07.015     Document Type: Article

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