Comparing the chemical properties of evaporated and sputtered niobium films on oxidized Si(1 0 0) wafers - Preparation of oxynitride films

Applied Surface Science

Volumn 252, Issue 1 SPEC. ISS., 2005, Pages 177-184

  Brunkahl, O ^a   Bock, W ^b   Thoma, K ^c   Kolbesen, B O ^a  

^a GOETHE UNIVERSITY   (Germany)

^b University of Koblenz Landau   (Germany)

^c UNIVERSITY OF KASSEL   (Germany)

Author keywords

Niobium; Nitride; Oxynitride; RTP; SIMS

Indexed keywords

CRYSTALLIZATION; EVAPORATION; OXIDATION; SECONDARY ION MASS SPECTROMETRY; SPUTTERING; X RAY DIFFRACTION ANALYSIS;

CRYSTALLITES; EVAPORATED FILMS; OXYNITRIDE; RAPID THERMAL PROCESSING (RTP);

NIOBIUM;

EID: 24644506685     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2005.02.015     Document Type: Conference Paper

References (7)

1. A. Berendes, O. Brunkahl, C. Angelkort, W. Bock, F. Hofer, P. Warbichler, and B.O. Kolbesen Anal. Bioanal. Chem. 379 2004 554 567
2. G. Andersson, and A. Magneli Acta Chem. Scand. 11 1957 1065
3. G.J.P. Krooshof, F.H.P.M. Habracken, W.F. van der Weg, L. van den Hove, K. Maex, and R.F. De Keersmaecker J. Appl. Phys. 63 10 1988 5110
4. C. Angelkort, H. Lewalter, P. Warbichler, F. Hofer, W. Bock, and B.O. Kolbesen Spectrochim. Acta A 57 2001 2077
5. A.L. Bowman, T.C. Wallace, J.L. Yarnell, and R.G. Wenzel Acta Crystallogr. 21 1966 843
6. G. Kuz'micheva, V. Murashov, A. Mitin, and E. Khlybov Russ. J. Inorg. Chem. (Engl. Transl.) 18 1993 149
7. G. Kothleitner, M. Rogers, W. Bock, A. Berendes, B.O. Kolbesen, this volume.