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Volumn 200, Issue 1-4 SPEC. ISS., 2005, Pages 717-720

IPVD deposition of titanium based thin films

Author keywords

IPVD; Materials; Radio frequency; Thin films; Titanium

Indexed keywords

IONIZATION; MAGNETRON SPUTTERING; OXYGEN; PHYSICAL VAPOR DEPOSITION; PLASMAS; PRESSURE EFFECTS; THIN FILMS;

EID: 24644504059     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2005.01.088     Document Type: Article
Times cited : (8)

References (7)
  • 4
    • 24644491661 scopus 로고    scopus 로고
    • Modelling plasma equipment and feature profile in ionised metal physical vapour deposition
    • Thesis, University of Illinois
    • J. Lu, Modelling plasma equipment and feature profile in ionised metal physical vapour deposition, Thesis, University of Illinois, 2001.
    • (2001)
    • Lu, J.1
  • 6
    • 24644511059 scopus 로고    scopus 로고
    • Plasma Deposition Of Nano-structured and Nano-layered Thin Films For Biomedical Applications
    • NANOMED, INTAS project n° 2001-2274
    • NANOMED, INTAS project n° 2001-2274, Plasma Deposition Of Nano-structured and Nano-layered Thin Films For Biomedical Applications.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.