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Volumn 200, Issue 1-4 SPEC. ISS., 2005, Pages 717-720
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IPVD deposition of titanium based thin films
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Author keywords
IPVD; Materials; Radio frequency; Thin films; Titanium
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Indexed keywords
IONIZATION;
MAGNETRON SPUTTERING;
OXYGEN;
PHYSICAL VAPOR DEPOSITION;
PLASMAS;
PRESSURE EFFECTS;
THIN FILMS;
IONISED PHYSICAL VAPOUR DEPOSITION (IPVD);
OXYGEN CONTAMINATION;
RADIO FREQUENCY;
TITANIUM;
COATING;
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EID: 24644504059
PISSN: 02578972
EISSN: None
Source Type: Journal
DOI: 10.1016/j.surfcoat.2005.01.088 Document Type: Article |
Times cited : (8)
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References (7)
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