Influence of the electrical field on the formation process of holographic diffraction gratings (HDG) in vitreous chalcogenide semiconductors

Journal of Optoelectronics and Advanced Materials

Volumn 7, Issue 4, 2005, Pages 1823-1829

  Nastas, A M ^a   Andriesh, A M ^a   Bivol, V V ^a   Prisacari, A M ^a   Triduh, G M ^a  

^a INSTITUTE OF CHEMISTRY   (Moldova)

Author keywords

(as2S3) (As 2Se3); Holographic diffraction gratings

Indexed keywords

CHALCOGENIDES; DIFFRACTION EFFICIENCY; EFFICIENCY; ELECTRODES; ETCHING; HOLOGRAPHY; METALLIZING; METALS;

(AS2S3)-(AS2SE3); DIFFRACTION STRUCTURES; FORMATION PROCESS; HOLOGRAPHIC DIFFRACTION; HOLOGRAPHIC DIFFRACTION GRATINGS; POSSIBLE MECHANISMS; THIN-FILM STRUCTURE; VITREOUS CHALCOGENIDE SEMICONDUCTORS;

DIFFRACTION GRATINGS;

EID: 24644487735     PISSN: 14544164     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

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