New application of inorganic chalcogenide photoresists in lift-off photolithography

Journal of Optoelectronics and Advanced Materials

Volumn 5, Issue 5, 2003, Pages 1361-1364

  Veinguer, M ^a   Feigel, A ^a   Sfez, B ^a   Klebanov, M ^b   Lyubin, V ^b  

^a Electro Optics Division   (Israel)

^b BEN GURION UNIVERSITY OF THE NEGEV   (Israel)

Author keywords

Chalcogenide glassy films; Chalcogenide photoresist; Lift off photolithography

Indexed keywords

ARSENIC COMPOUNDS; DIFFRACTION GRATINGS; ETCHING; EVAPORATION; GLASS; LIGHT ABSORPTION; LIGHT INTERFERENCE; MICROLENSES; OPTICAL FILMS; OPTICAL RESOLVING POWER; PHOTOSENSITIVITY; QUARTZ; REFRACTIVE INDEX; THIN FILMS;

LIFT-OFF PROCESS; PHOTONIC-BAND-GAP STRUCTURES;

PHOTORESISTS;

EID: 0348134606     PISSN: 14544164     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

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