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Volumn 5, Issue 5, 2003, Pages 1361-1364

New application of inorganic chalcogenide photoresists in lift-off photolithography

Author keywords

Chalcogenide glassy films; Chalcogenide photoresist; Lift off photolithography

Indexed keywords

ARSENIC COMPOUNDS; DIFFRACTION GRATINGS; ETCHING; EVAPORATION; GLASS; LIGHT ABSORPTION; LIGHT INTERFERENCE; MICROLENSES; OPTICAL FILMS; OPTICAL RESOLVING POWER; PHOTOSENSITIVITY; QUARTZ; REFRACTIVE INDEX; THIN FILMS;

EID: 0348134606     PISSN: 14544164     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper
Times cited : (22)

References (10)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.