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Volumn 5, Issue 5, 2003, Pages 1361-1364
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New application of inorganic chalcogenide photoresists in lift-off photolithography
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Author keywords
Chalcogenide glassy films; Chalcogenide photoresist; Lift off photolithography
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Indexed keywords
ARSENIC COMPOUNDS;
DIFFRACTION GRATINGS;
ETCHING;
EVAPORATION;
GLASS;
LIGHT ABSORPTION;
LIGHT INTERFERENCE;
MICROLENSES;
OPTICAL FILMS;
OPTICAL RESOLVING POWER;
PHOTOSENSITIVITY;
QUARTZ;
REFRACTIVE INDEX;
THIN FILMS;
LIFT-OFF PROCESS;
PHOTONIC-BAND-GAP STRUCTURES;
PHOTORESISTS;
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EID: 0348134606
PISSN: 14544164
EISSN: None
Source Type: Journal
DOI: None Document Type: Conference Paper |
Times cited : (22)
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References (10)
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