Growth of highly resistive BiMnO 3 films

Applied Physics Letters

Volumn 87, Issue 10, 2005, Pages

  Eerenstein, W ^a   Morrison, F D ^a   Scott, J F ^a   Mathur, N D ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC MEASUREMENTS; GROWTH PARAMETERS; MAGNETOELECTRIC MEASUREMENTS; RESISTIVITY;

BISMUTH COMPOUNDS; DIELECTRIC MATERIALS; ELECTRIC CONDUCTIVITY; EPITAXIAL GROWTH; MAGNETIC PROPERTIES; MICROSTRUCTURE; OPTIMIZATION; PULSED LASER DEPOSITION; SUBSTRATES;

METALLIC FILMS;

EID: 24644481351     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2039988     Document Type: Article

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