Room-temperature adsorption of Si atoms on H-terminated Si(001)-2 x 1 surface

Journal of the Physical Society of Japan

Volumn 74, Issue 1, 2005, Pages 389-392

  Kajiyama, Hiroshi ^a   Suwa, Y ^a   Heike, S ^a   Fujimori, M ^a   Nara, J ^b   Ohno, T ^b   Matsuura, S ^c   Hitosugi, T ^c   Hashizume, T ^a  

^a HITACHI LTD   (Japan)

^b NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^c UNIVERSITY OF TOKYO   (Japan)

Author keywords

Adsorption; DFT; Dissipation; Silicon; STM; Surface

Indexed keywords

EID: 24644473155     PISSN: 00319015     EISSN: None     Source Type: Journal    
DOI: 10.1143/JPSJ.74.389     Document Type: Article

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