Control of acidity of the substrate for precise pattern fabrication using a chemically amplified resist

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3333, Issue , 1998, Pages 820-829

  Satou, Isao ^a   Yabe, Sachiko ^a   Watanabe, Minoru ^a   Taguchi, Takashi ^a  

^a OKI ELECTRIC INDUSTRY CO   (Japan)

Author keywords

Anti reflective coating; Cleaning; Contamination; Heating treatment; Substrate

Indexed keywords

AMORPHOUS CARBON; CONTAMINATION; EXCIMER LASERS; FABRICATION; GAS LASERS; HEATING; KRYPTON; PHOTORESISTORS; PHOTORESISTS; REFLECTIVE COATINGS; SUBSTRATES; SULFURIC ACID;

A-C FILMS; ACIDIC RESIDUES; ALKALINE TREATMENTS; AMORPHOUS CARBONS (A-C); ANTI-REFLECTIVE COATING; CHEMICALLY AMPLIFIED RESISTS; CLEANING METHODS; CONTAMINATED FILMS; CONTAMINATED SUBSTRATES; CRITICAL DIMENSIONS; DEVICE FABRICATIONS; HEATING TREATMENT; HIGH TEMPERATURE TREATMENTS; HYDROPEROXIDE; KRF EXCIMER LASERS; PATTERN COLLAPSE; PATTERN FABRICATIONS; RESIST PATTERNING; SUBSTRATE MATERIALS; SUBSTRATE PROPERTIES; UV CURES; WET CLEANING PROCESS;

CLEANING;

EID: 0002872743     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.312430     Document Type: Conference Paper

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