A comprehensive comparison of spectral scatterometry hardware

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5752, Issue I, 2005, Pages 337-350

  Lensing, Kevin ^a   Stirton, Broc ^a   Starnes, Brian ^a   Synoradzki, Joseph ^b   Swain, Bryan ^c   Lane, Lawrence ^c  

^a ADVANCED MICRO DEVICES   (United States)

^b Advanced Process Control   (United States)

^c Timbre Technologies Inc   (United States)

Author keywords

Advanced process control (APC); Integrated metrology (IM); Reflectometry; Scatterometry; Spectroscopic ellipsometry

Indexed keywords

COMPUTER HARDWARE; COMPUTER SOFTWARE; ELLIPSOMETRY; MEASUREMENT THEORY; PROCESS CONTROL; REFLECTOMETERS; SPECTROSCOPIC ANALYSIS;

ADVANCED PROCESS CONTROL (APC); INTEGRATED METROLOGY (IM); REFLECTOMETRY; SCATTEROMETRY; SPECTROSCOPIC ELLIPSOMETRY;

LIGHT SCATTERING;

EID: 24644445115     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.600783     Document Type: Conference Paper

References (4)

1. G. E. Jellison, "Physics of Optical Metrology of Silicon-Based Semiconductor Devices," from Handbook of Silicon Semiconductor Metrology, A. C. Diebold editor, Marcel Dekker, 2001: pp. 723-760.
2. J.L. Stehle et al, "Ultraviolet, Vacuum Ultraviolet, and Extreme Ultraviolet Spectroscopic Reflectometry and Ellipsometry," from Handbook of Silicon Semiconductor Metrology, A. C. Diebold editor, Marcel Dekker, 2001 : pp. 761-788.
3. C. Hayzelden, "Gate Dielectric Metrology," from Handbook of Silicon Semiconductor Metrology, A. C. Diebold editor, Marcel Dekker, 2001: pp. 17-47.
4. K.R. Lensing et al, "Scatterometry Feasibility Studies for 0.13-Micron Flash Memory Lithography Applications; Enabling Integrated Metrology," presented at SPIE Microlithography 2004, Santa Clara, CA, February 24, 2004.