Excimer laser beam homogenizer with low divergence

Applied Physics A: Materials Science and Processing

Volumn 69, Issue 7, 1999, Pages

  Jasper, K ^a   Scheede, S ^b   Burghardt, B ^b   Senczuk, R ^b   Berger, P ^a   Kahlert, H J ^b   Hugel H ^a  

^a UNIVERSITY OF STUTTGART   (Germany)

^b MicroLas Lasersystem GmbH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 24444433745     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s003390051407     Document Type: Article

References (3)

1. P. Berger, K. Jasper, G. Cailles: patent pending, DE 19724060A1 (1998)
2. H. Hügel, H. Schittenhelm, K. Jasper, G. Callies: J. Laser Appl. 10, 255 (1998)
3. K. Jasper, P. Berger, H. Hügel: SPIE 3618, 403 (1999)