Dependence of nitriding degree of Ti surface by non-LTE nitrogen plasma on various plasma parameters

Thin Solid Films

Volumn 457, Issue 1, 2004, Pages 69-77

  Kobori, H ^a   Koike, S ^a   Watanabe, S ^a   Matsuzaki, M ^a   Matsuura, H ^a   Akatsuka, H ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Plasma processing and deposition; Titanium; Titanium nitride

Indexed keywords

ATMOSPHERIC PRESSURE; CARRIER CONCENTRATION; CORRELATION METHODS; DEPOSITION; ELECTRONS; ENERGY TRANSFER; MICROWAVES; NITRIDING; PARAMETER ESTIMATION; PLASMAS; TITANIUM; X RAY DIFFRACTION ANALYSIS;

MICROWAVE DISCHARGE NITROGEN PLASMA; PLASMA PROCESSING AND DEPOSITION; ROTATION TEMPERATURE; VIBRATION TEMPERATURE;

TITANIUM NITRIDE;

EID: 2442623178     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2003.12.016     Document Type: Conference Paper

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