High-rate, low-temperature radical-assisted sputtering coater and its applications for depositing high-performance optical filters

Vacuum

Volumn 74, Issue 3-4 SPEC. ISS., 2004, Pages 409-415

  Song, Yizhou ^a   Sakurai, Takeshi ^a  

^a Shincron Co Ltd   (Japan)

Author keywords

Intermediate refractive index; Optical thin film; Radical; Sputtering

Indexed keywords

DEPOSITION; FREE RADICALS; LOW TEMPERATURE EFFECTS; MULTILAYERS; OPTICAL FILTERS; OXIDATION; REFRACTIVE INDEX; SPUTTERING; STOICHIOMETRY;

DEPOSITION RATES; INTERMEDIATE REFRACTIVE INDEX; OPTICAL PASS BANDS; OPTICAL THIN FILMS;

THIN FILMS;

EID: 2442614727     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2004.01.008     Document Type: Article

References (6)

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5. Yizhou Song, et al. Vacuum 2000;59:755-763
6. Nagae E, et al. Technical digest of optical interference coatings. Optical Society of America, Banff, Canada, July 2001.