Plasma surface treatment effect of TiO2 thin film

Vacuum

Volumn 74, Issue 3-4 SPEC. ISS., 2004, Pages 643-646

  Chiba, Yoshiaki ^a   Kashiwagi, Kunihiro ^a   Kokai, Hideki ^a  

^a TOYO UNIVERSITY   (Japan)

Author keywords

Photocatalyst; Plasma surface treatment; RF reactive ion plating; TiO2 thin film

Indexed keywords

CATALYSTS; CHEMICAL BONDS; CRYSTAL STRUCTURE; DECOMPOSITION; FREE RADICALS; ION BEAMS; LIGHT ABSORPTION; OXIDATION; PHOTOCATALYSIS; PLASMA APPLICATIONS; SURFACE TREATMENT; TITANIUM DIOXIDE;

PHOTOCATALYSTS; PLASMA SURFACE TREATMENT; RF REACTIVE ION PLATING; TIO2 THIN FILMS;

THIN FILMS;

EID: 2442551538     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2004.01.038     Document Type: Article

References (5)

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