Self-assembly of gold nanoparticles prepared with 3,4- ethylenedioxythiophene as reductant

Journal of Physical Chemistry B

Volumn 108, Issue 17, 2004, Pages 5192-5199

  Li, Xiaohong ^a,b   Li, Yunchao ^a,b   Tan, Yiwei ^a   Yang, Chunhe ^a   Li, Yongfang ^a  

^a INSTITUTE OF GEOLOGY AND GEOPHYSICS   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

Author keywords

[No Author keywords available]

Indexed keywords

AGGLOMERATION; COLLOIDS; CYCLIC VOLTAMMETRY; GOLD; NANOSTRUCTURED MATERIALS; ORGANIC COMPOUNDS; REDUCTION; SCANNING ELECTRON MICROSCOPY;

CHEMICAL STABILIZERS; NANOCIRCUITS; NANOPARTICLES; REDUCTANTS;

SELF ASSEMBLY;

EID: 2442543037     PISSN: 15206106     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp0356618     Document Type: Article

References (38)

1. Schmid, G. Chem. Rev. 1992, 92, 1709.
2. Cosandey, F.; Madey, T. E. Surf. Rev. Lett. 2001, 8, 73.
3. Bamwenda, G. R.; Tsubota, S.; Nakamura, T.; Haruta, M. Catal. Lett. 1997, 44, 83.
4. Valden, M.; Lai, X.; Goodman, D. W. Science. 1998, 281, 1647.
5. Brown, L.; Hutchison, J. J. Phys. Chem. B 2001, 105, 8911.
6. Whetten, R.; Khoury, J.; Alvarez, M.; Murthy, S.; Vezmar, I.; Wang, Z.; Stephens, P.; Cleveland, C.; Luedtke, W.; Landman, U. Adv. Mater. 1996, 8, 428.
7. Turkevich, J.; Stevenson, P. C.; Hiller, J. Discuss. Faraday Soc. 1951, 11, 55.
8. Enustun, B.; Turkevich, J. J. Am. Chem. Soc. 1963, 85, 3317.
9. Brust, M.; Walker, M.; Bethell, D.; Schiffrin, D. J.; Whyman, R. J. Chem. Soc., Chem. Commun. 1994, 7, 801.
10. Sarathy, K. V.; Raina, G.; Yadav, R. T.; Kulkarni, G. U.; Rao, C. N. R. J. Phys. Chem. B 1997, 101, 9876.
11. Dai, X.; Tan, Y.; Xu, J. Langmuir 2002, 18, 9010.
12. Zhou, Q.; Bao, J.; Xu, Z. J. Mater. Chem. 2002, 12, 384.
13. Jin, J.; Iyoda, T.; Cao, C.; Song, Y.; Jiang, L.; Li, T.; Zhu, D.; Angew. Chem., Int. Ed. 2001, 40, 2135.
14. Youk, J.; Locklin, J.; Xia, C.; Park, M.; Advincula, R. Langmuir 2001, 17, 4681.
15. Granström, M.; Berggren, M.; Inganäs, O. Science 1995, 267, 1479.
16. Heywang, G.; Joans, F. Adv. Mater. 1992, 4, 116.
17. Bayer, A. G. U.S. Patent 5, 035, 926, 1991.
18. De Leeuw, D. M.; Kraakman, R. A.; Bongaerts, P. F. G.; Mutsaers, C. M. J.; Klaasen, D. B. M. Synth. Met. 1994, 66, 263.
19. Thomas, K. G.; Zajicek, J.; Kamat, P. V. Langmuir 2002, 18, 3722.
20. Shipway. A. N.; Lahav, M.; Gabai, R.; Willner, I. Langmuir 2000, 16, 8789.
21. (a) Mie, G. Ann. Physik 1908, 25, 377.
22. (b) Kreibig, U.; Genzel, L. Surf. Sci. 1985, 156, 678.
23. (c) Creighton, J. A.; Eadon, D. G. J. Chem. Soc., Faraday Trans. 1991, 87, 3881.
24. (d) Norman, T. J., Jr.; Grant, C. D.; Magana, D.; Zhang, J.; Liu, J.; Cao, D.; Bridges, F.; Van Buuren, A. J. Phys. Chem. B 2002, 106, 7005.
25. Pei, Q.; Zuccarello, G.; Ahlskog, M.; Inganäs, O. Polymer 1994, 35, 1347.
26. Cullity, B. D. Elements of X-ray Diffraction, 2nd ed.; Addision-Wesley: Menlo Park, CA, 1978.
27. Hüfner, S. Photoelectron Spectroscopy, 2nd ed.; Springer-Verlag: New York, 1996.
28. Sakmeche, N.; Aeiyach, S.; Aaron, J.; Jouini, M.; Lacroix, J. C.; Lacaze, P. Langmuir 1999, 15, 2566.
29. Leff, D. V.; Brandt, L.; Heath, J. R. Langmuir 1996, 12, 4723.
30. Tan, Y. W.; Jiang, L.; Li, Y. F.; Zhu, D. B. J. Phys. Chem. B 2002, 106, 3131.
31. Dalmia, A.; Lineken, C. L.; Savinell, R. F. J. Colliod Interface Sci. 1998, 205, 535.
32. Wolf, M.; Knoesel, E.; Hertel, T. Phys. Rev. B 1996, 54, R5295.
33. Sandhyarani, N.; Pradeep, T. J. Mater. Chem. 2000, 10, 981.
34. Heath, J. R.; Knobler, C. M.; Leff, D. V. J. Phys. Chem. 1997, 101, 189.
35. Zhou, Y.; Itoh, H.; Uemura, T.; Naka, K.; Chujo, Y. Langmuir 2002, 18, 277.
36. Peng, X. G.; Wickham, J.; Alivisatos, A. P. J. Am. Chem. Soc. 1998, 120, 5343.
37. Bruinsma, P. J.; Kim, A. Y.; Liu, J.; Baskaran, S. Chem. Mater. 1997, 9, 2507.
38. Fink, J.; Kiely, C. J.; Bethell, D.; Schiffrin, D. J. Chem. Mater. 1998, 10, 922.