Ion beam analysis of TiN/Ti multilayers deposited by magnetron sputtering

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 219-220, Issue 1-4, 2004, Pages 763-767

  Andrade, E ^a   Flores, M ^b   Muhl, S ^c   Barradas, N P ^d   Murillo, G ^e   Zavala, E P ^a   Rocha, M F ^f  

^a UNIVERSIDAD NACIONAL AUTÓNOMA DE MÉXICO   (Mexico)

^b UNIVERSITY OF GUADALAJARA   (Mexico)

^c INSTITUTO DE INVESTIGACIONES EN MATERIALES   (Mexico)

^d INSTITUTO TECNOLÓGICO E NUCLEAR   (Portugal)

^e INSTITUTO NACIONAL DE INVESTIGACIONES NUCLEARES   (Mexico)

^f INSTITUTO POLITÉCNICO NACIONAL   (Mexico)

Author keywords

Corrosion resistance; IBA methods; Reactive magnetron sputtering; TiN Ti thin films

Indexed keywords

COATINGS; CORROSION RESISTANCE; INTERFACES (MATERIALS); MAGNETRON SPUTTERING; MICROSTRUCTURE; POROSITY; STAINLESS STEEL; SUBSTRATES; THIN FILMS; TITANIUM ALLOYS;

IBA METHODS; POTENTIODYNAMIC POLARIZATION; REACTIVE MAGNETRON SPUTTERING; TIN/TI THIN FILMS;

ION BEAMS;

EID: 2442538880     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2004.01.159     Document Type: Conference Paper

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