Evaluation of internal stresses in TiN thin films by synchrotron radiation

Vacuum

Volumn 74, Issue 3-4 SPEC. ISS., 2004, Pages 571-575

  Hanabusa, T ^a   Kusaka, K ^a   Matsue, T ^b   Nishida, M ^c   Sakata, O ^d   Sato, T ^e  

^a UNIVERSITY OF TOKUSHIMA   (Japan)

^b NIIHAMA NATIONAL COLLEGE OF TECHNOLOGY   (Japan)

^c KOBE CITY COLLEGE OF TECHNOLOGY   (Japan)

^d JAPAN SYNCHROTRON RADIATION RESEARCH INSTITUTE   (Japan)

^e KOBE STEEL LTD   (Japan)

Author keywords

Arc ion plating; Internas stress; Synchrotron radiation; Thin film; Titanium nitride

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPRESSIVE STRESS; CRYSTAL ORIENTATION; CUTTING TOOLS; RESIDUAL STRESSES; STAINLESS STEEL; SYNCHROTRON RADIATION; TITANIUM NITRIDE;

ARC-ION PLATING; STRESS FORMATION;

THIN FILMS;

EID: 2442499147     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2004.01.029     Document Type: Article

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