Quantitative evaluation of pinhole defects in TiN films prepared by r.f. reactive sputtering

Materials Science Research International

Volumn 5, Issue 4, 1999, Pages 265-269

  Uchida, Hitoshi ^a   Inoue, Shozo ^a   Nakano, Yasuhide ^a   Koterazawa, Keiji ^a  

^a UNIVERSITY OF HYOGO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANODIC POLARIZATION; CORROSION RESISTANCE; CURRENT DENSITY; ELECTROCHEMISTRY; OPTICAL MICROSCOPY; PASSIVATION; PEELING; POTASSIUM COMPOUNDS; PROTECTIVE COATINGS; STAINLESS STEEL; SULFURIC ACID;

PINHOLE DEFECTS; RADIO FREQUENCY REACTIVE SPUTTERING;

TITANIUM NITRIDE;

EID: 0033311111     PISSN: 13411683     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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