Quantitative XPS analysis of PEG-modified silicon surfaces

Journal of Physical Chemistry B

Volumn 108, Issue 17, 2004, Pages 5185-5188

  Popat, Ketul C ^a   Sharma, Sadhana ^b   Desai, Tejal A ^a  

^a Boston University   (United States)

^b OHIO STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BINDING ENERGY; CHEMICAL BONDS; CHEMICAL MODIFICATION; COMPUTER SOFTWARE; CURVE FITTING; ESTIMATION; KINETIC ENERGY; LANGMUIR BLODGETT FILMS; POLYETHYLENE GLYCOLS; REFRACTIVE INDEX; X RAY PHOTOELECTRON SPECTROSCOPY;

GRAFTING DENSITY; INELASTIC MEAN FREE PATH (IMFP); PEG FILMS; PHASE REACTIONS;

SILICON;

EID: 2442482401     PISSN: 15206106     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp049260j     Document Type: Article

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