The structure of TiN films deposited by arc ion plating

Vacuum

Volumn 66, Issue 3-4, 2002, Pages 435-439

  Matsue, Tatsuya ^a   Hanabusa, Takao ^b   Ikeuchi, Yasukazu ^a  

^a NIIHAMA NATIONAL COLLEGE OF TECHNOLOGY   (Japan)

^b UNIVERSITY OF TOKUSHIMA   (Japan)

Author keywords

Arc ion plating; Crystal structure; Titanium nitride; X ray diffraction; X ray photoelectron spectroscopy

Indexed keywords

CORROSION RESISTANCE; CRYSTAL ORIENTATION; ELECTRODEPOSITION; ELECTROPLATING; INTERFACES (MATERIALS); NITROGEN; PROTECTIVE COATINGS; SURFACE PHENOMENA; TITANIUM NITRIDE; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

ARC ION PLATINGS;

CERAMIC COATINGS;

EID: 0037136089     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(02)00167-7     Document Type: Article

References (10)