Patterned nanoporous poly(methylsilsesquioxane) thin films: A potential high density substrate

Materials Science and Engineering C

Volumn 24, Issue 4, 2004, Pages 487-490

  Hogan, Zach L ^a   Kreller, Cortney R ^a   Tran, Kiet A ^a   Hart, Mark W ^a   Wallraff, Gregory M ^a   Swanson, Sally A ^a   Volksen, Willi ^a   Lee, Victor Y ^a   Magbitang, Teddie P ^a   Hedrick, James L ^a   Hawker, Craig J ^a   Miller, Robert D ^a   Kim, Ho Cheol ^a  

^a IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

Fluorescent dye; High density biosubstrate; Lithographic patterning; Nanoporous thin films; Poly(methylsilsesquioxane)

Indexed keywords

HYDROPHILICITY; PLASTIC FILMS; POROUS MATERIALS; REACTIVE ION ETCHING; SILICON WAFERS; SUBSTRATES;

BIOPROBE MOLECULES; NANOPOROUS FILMS;

MATERIALS SCIENCE;

DYE;

EID: 2442466886     PISSN: 09284931     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.msec.2003.10.002     Document Type: Article

References (12)

1. Pirrung M.C. Angew. Chem., Int. Ed. 41 2002 1276
2. MacBeath G. Schreiber S.L. Science 289 2000 1760
3. Glazer M. Frank C. Vinci R.P. Mcgall G. Fidanza J. Beecher J. Mater. Res. Soc. Symp. Proc. 576 1999 371
4. D. Doshi, H. Fan, N. Huesing, A. Hurd, C.J. Brinker, US Pat No 2002/0127498A1
5. Walheim S. Schaffer E. Mlynek J. Steiner U. Science 283 1999 520
6. Kim H.-C. Wilds J.B. Kreller C.R. Volksen W. Brock P.J. Lee V.Y. Magbitang T. Hedrick J.L. Hawker C.J. Miller R.D. Adv. Mater. 14 2002 1637
7. Volksen W. Hawker C.J. Hedrick J.L. Lee V. Magbitang T. Toney M. Miller R.D. Huang E. Liu J. Lynn K.G. Petkov M. Rodbell K. Weber M.H. Ho P.S. Leu J. Lee W.W. Low Dielectric Constant Materials for IC Applications 2002 167 Springer-Verlag Berlin
8. Stein A. Melde B.J. Schroden R.C. Adv. Mater. 12 2000 1403
9. Lei C. Shin Y. Liu J. Ackerman E.J. J. Am. Chem. Soc. 124 2002 11242
10. Wood P.C. Wydeven T. Tsuji O. Mater. Res. Soc. Symp. Proc. 315 1993 237
11. Keene M.T.J. Denoyl R. Llewellyn P.L. Chem. Commun. 20 1998 2203
12. Clark T. Jr. Ruiz J.D. Fan H. Brinker C.J. Swanson B.I. Parikh A.N. Chem. Mater. 12 2000 3879