Chemical vapor infiltration (CVI)-Part I: A new technique to achieve diamond composites

Diamond and Related Materials

Volumn 13, Issue 4-8, 2004, Pages 834-838

  Glaser, A ^a   Rosiwal, S M ^a   Freels, B ^a   Singer, R F ^a  

^a UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

Author keywords

Chemical vapor infiltration or interface structure; Electronic device structures; Hot filament CVD; Silicon carbide

Indexed keywords

CHEMICAL REACTORS; CHEMICAL VAPOR DEPOSITION; COMPOSITE MATERIALS; FLOW OF FLUIDS; HEAT SINKS; SUBSTRATES; TRIBOLOGY;

CHEMICAL VAPOR INFILTRATION (CVI); DIAMOND COMPOSITES; MICROWAVE PLASMA DEPOSITION REACTORS;

DIAMONDS;

DIAMOND;

EID: 2442440944     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2003.10.041     Document Type: Article

References (14)

1. Schaarschmidt G. Laufer B.M.S. Werninghaus T. Zahn D.R.T. Hinneberg H.-J. Diamond Relat. Mater. 6 1997 1019-1025
2. Monteiro O.R. Liu H. Diamond Relat. Mater. 12 2003 1357-1361
3. Eaton S.C. Sunkara M.K. Ueno M. Walsh K. Diamond Relat. Mater. 10 2001 2212-2219
4. Baerns M. Hofmann H. Renken A. Chemische Reaktionstechnik 1999 74-77 Georg Thieme Stuttgart
5. Huettinger K.J. Adv. Mater. CVD 4 1998 151-158
6. Sanchez O. Garcia M.M. Vazquez L. Gonez-Aleixandre C. Vacuum 45 10-11 1994 1015-1016
7. Albella J.M. Gomez-Aleixandre C. Sanchez-Garrido O. Vazquez L. Martinez-Duart J.M. Surf. Coat. Technol. 70 1995 163-174
8. Greil P. Lifka T. Kaindl A. J. Eur. Ceram. Soc. 18 1998 1961-1973
9. Sieber H. Hoffmann C. Kaindl A. Greil P. Adv. Eng. Mater. 2 2000 105-109
10. Silva F. Gicquel A. Tardieu A. Cledat P. Chauveau T. Diamond Relat. Mater. 5 1996 338-344
11. Schwarz S. Rosiwal S.M. Frank M. Breidt D. Singer R.F. Diamond Relat. Mater. 11 2002 589-595
12. Goodwin D.G. J. Appl. Phys. 74 1993 6888-6894
13. Angus J.C. Evans E.A. Paoletti A. Tucciarone A. The Physics of Diamond 1997 31-44 IOS Press Amsterdam
14. Shroder R.E. Nemanich R.J. Glass J.T. Phys. Rev. B 41 6 1990 3738-3745