Formation of graphite re-deposition layer by hydrogen RF plasma

Thin Solid Films

Volumn 457, Issue 1, 2004, Pages 151-157

  Katayama, K ^a   Nagase, H ^a   Manabe, Y ^a   Kodama, Y ^a   Takeishi, T ^a   Nishikawa, M ^a  

^a KYUSHU UNIVERSITY   (Japan)

Author keywords

Hydrogen retention; Re deposition layer; RF plasma; Sputtering

Indexed keywords

DEPOSITION; DESORPTION; ELECTRODES; FUSION REACTIONS; ISOTOPES; PRESSURE EFFECTS; QUARTZ; SCANNING ELECTRON MICROSCOPY; SPUTTERING; THERMAL EFFECTS; TOKAMAK DEVICES;

HYDROGEN RETENTION; PLASMA PARAMETER; RE-DEPOSITION LAYER; RF PLASMA;

GRAPHITE;

EID: 2442432311     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2003.12.030     Document Type: Conference Paper

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