Patterning of SU-8 resist structures using CF4

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5276, Issue , 2004, Pages 162-172

  Vora, K D ^a   Holland, A S ^b   Grantasala, M K ^a   Mitchell, A ^b  

^a SWINBURNE UNIVERSITY OF TECHNOLOGY   (Australia)

^b RMIT UNIVERSITY   (Australia)

Author keywords

CF4; Etch rate; Reactive plasma etching; Side wall angle; SU 8; Surface roughness; Taguchi optimization

Indexed keywords

CARBON INORGANIC COMPOUNDS; FLOW OF FLUIDS; MASKS; MICROELECTROMECHANICAL DEVICES; OPTIMIZATION; PHOTOLITHOGRAPHY; PLASMA ETCHING; SPUTTERING; SURFACE ROUGHNESS;

REACTIVE PLASMA ETCHING; SINGLE-WALL ANGLE; TAGUCHI OPTIMIZATION;

PHOTORESISTS;

EID: 2442419704     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.523903     Document Type: Conference Paper

References (9)

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