Use of SU-8 negative photoresist for optical mask manufacturing

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3999, Issue , 2000, Pages

  Bogdanov, Alexei L ^a  

^a LUND UNIVERSITY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; ELECTRON BEAM LITHOGRAPHY; MASKS; REACTIVE ION ETCHING;

CHEMICAL AMPLIFICATION; CRITICAL DIMENSIONS (CD); ION MILLING; PHOTOMASKS; WET ETCHING;

PHOTORESISTS;

EID: 0033715930     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)