Study of chemical dissolution of the barrier oxide layer of porous alumina films formed in oxalic acid using a re-anodizing technique

Applied Surface Science

Volumn 236, Issue 1-4, 2004, Pages 270-277

  Vrublevsky, I ^a   Parkoun, V ^a   Sokol, V ^a   Schreckenbach, J ^b  

^a BELARUSIAN STATE UNIVERSITY OF INFORMATICS AND RADIOELECTRONICS   (Belarus)

^b CHEMNITZ UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

Aluminium; Barrier oxide layer; Dissolution rate; Microporosity; Pits; Porous alumina; Re anodizing

Indexed keywords

ALUMINA; ALUMINUM; DIELECTRIC MATERIALS; DIGITAL VOLTMETERS; DISSOLUTION; ELECTRIC POTENTIAL; ION BEAMS; MICROPOROSITY; PHOSPHORIC ACID; POROUS MATERIALS; THERMAL EFFECTS;

BARRIER OXIDE LAYERS; OXALIC ACID SOLUTIONS; PITS; POROUS ALUMINA FILMS; RE-ANODIZING TECHNIQUES;

METALLIC FILMS;

EID: 4043167589     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2004.04.030     Document Type: Article

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