Status of 157-nm optical lithography

Journal of Microlithography, Microfabrication and Microsystems

Volumn 4, Issue 1, 2005, Pages 1-5

  Trybula, Walter J ^a  

^a SEMATECH   (United States)

Author keywords

157 nm optical lithography; 193 nm immersion; Production lithography

Indexed keywords

157-NM OPTICAL LITHOGRAPHY; 193-NM IMMERSION; PRODUCTION LITHOGRAPHY; PRODUCTION TOOLS;

MANUFACTURE; PRODUCTIVITY; SCHEDULING; TECHNOLOGICAL FORECASTING;

PHOTOLITHOGRAPHY;

EID: 24144480999     PISSN: 15371646     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.1860401     Document Type: Article

References (12)

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3. C. van Peski, "Fused silica pellicle mounting," 3rd Ann. 157-nm Symp. (Sep. 2002).
4. R. Engelstad et al., "Mounting and simulation of pellicle mounting," SEMATECH Report (Dec. 2003).
5. J. H. Burnett, Z. H. Levine, and E. L. Shirley, "Intrinsic birefringence in calcium fluoride and barium fluoride," Phys. Rev. B 64, 241102 (2001).
6. J. H. Burnett, Z. H. Levine, and E. L. Shirley, "Intrinsic birefringence in 157 nm materials," in Calcium Fluoride Birefringence Workshop, R. Harbison, Ed., International SEMATECH, Austin, TX (2001).
7. M. Rothschild, Private communication.
8. 2 lens blanks status of EAPSM blanks," 2004 Litho Forum (Jan. 2004).
9. R. Engelstad, "Effects of material properties on patterning distortions of optical reticles," Proc. SPIE 3546, 214-220 (1998).
10. SEMATECH. 2004 LithoForum (2004).
11. M. Switkes et al., "Immersion lithography, optics for the 50 nm node," 3rd Annual 157-nm Symp. (Sep. 2002).
12. R. French, "Structure-composition-property relations of 157-nm fluoromolecular fluids for 157-nm immersion lithography," EIPBN (2004).