Theoretical and experimental studies on retention characteristics of metal-ferroelectric-insulator-semiconductor and metal-insulator-ferroeleclric-insulator-semiconductor structures

Materials Research Society Symposium - Proceedings

Volumn 655, Issue , 2001, Pages XCXXXIV-XCXXXV

  Okuyama, Masanori ^a   Takahashi, Mitsue ^a   Kodama, Kazushi ^a   Nakaiso, Toshiyuki ^a   Noda, Minoru ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 24144470857     PISSN: 02729172     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (6)

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2. S. Xiong and S. Sakai, Appl. Phys. Lett. 75, 1613, 1999
3. M. Okuyama, H. Sugiyama, T. Nakaiso and M. Noda: to be published in the Journal of Integrated Ferroelectrics, 2000.
4. M. Takahashi, H. Sugiyama, T. Nakaiso, K. Kodama, M. Noda and M. Okuyama: to be published in Jpn. J. Appl. Phys., 2001
5. S. L. Miller and P. J. McWhorter, J. Appl. Phys. 72, 5999, 1992
6. E. Burstein and S. Lundqvist, Tunneling Phenomena in Solids. New York: PLENUM PRESS, 1969, Chap. 3, pp.23