Introduction to photolithography: Preparation of microscale polymer silhouettes

Journal of Chemical Education

Volumn 82, Issue 9, 2005, Pages 1365-1369

  Berkowski, Kimberly L ^a   Plunkett, Kyle N ^a   Yu, Qing ^a,b   Moore, Jeffrey S ^a  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

^b GENERAL ELECTRIC COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CROSSLINKING; MASKS; ORGANIC POLYMERS; PHOTOPOLYMERIZATION; PHOTORESISTS; STUDENTS; TEACHING;

MICROCHIP FABRICATION; MICROSCALE POLYMER SILHOUETTES;

PHOTOLITHOGRAPHY;

EID: 24144442739     PISSN: 00219584     EISSN: None     Source Type: Journal    
DOI: 10.1021/ed082p1365     Document Type: Article

References (11)

1. Chen, Y.; Pepin, A. Electrophoresis 2001, 22, 187-207.
2. Kilby, J. Miniturized Electronic Circuits. U.S. Patent. 3,138,743, June 23, 1964.
3. Noyce, R. N. Semiconductor Device-And-Lead Structure. U.S. Patent. 2,981,877, April 25, 1961.
4. Christenson, A. M.; Corder, G. W.; DeVore, T. C.; Augustine, B. H. J. Chem. Educ. 2003, 80, 183-186.
5. The Macrogalleria. http://www.psrc.usm.edu/macrog (accessed Jun 2005).
6. Crivello, J. V. Chemistry and Technology for UV and EB Formulation for Coatings, Inks, and Paints. In Photoinitiators for Free Radical Cationic and Anionic Photopolymerisation, 2nd ed.; Bradley, G., Ed.; J. Wiley in association with SITA Technology: Chichester, United Kingdom, 1998; Vol. 3.
7. Crivello, J. V. Photoinitiated Polymerization, ACS Symposium Series 847; American Chemical Society: Washington DC, 2003.
8. Peiffer, R. W. Photopolymerization: Fundamentals and Applications, ACS Symposium Series 673; American Chemical Society: Washington DC, 1997.
9. Kaur, M.; Srivastava, A. K. J. of Macromol. Sci. - Poly. Rev. 2002, C42, 481-512.
10. Stevens, M. P. Polymer Chemistry, An Introduction, 3rd ed.; Oxford University Press: New York, 1999.
11. Odian, G. Principles of Polymerization, 3rd ed.; John Wiley & Sons, Inc.: New York, 1991.