A photolithography laboratory experiment for general chemistry students

Journal of Chemical Education

Volumn 80, Issue 2, 2003, Pages 183-186

  Christenson, Adora M ^a   Corder, Gregory W ^b   DeVore, Thomas C ^b   Augustine, Brian H ^b  

^a GLAXOSMITHKLINE   (United States)

^b JAMES MADISON UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

INTEGRATED CIRCUITS; PHOTOCHEMICAL REACTIONS; PHOTOLITHOGRAPHY; POLYMERS; SPECTROSCOPIC ANALYSIS; STUDENTS; ULTRAVIOLET RADIATION; ULTRAVIOLET SPECTROMETERS;

MICROFABRICATED DEVICES;

CHEMICAL LABORATORIES;

EID: 0037314603     PISSN: 00219584     EISSN: None     Source Type: Journal    
DOI: 10.1021/ed080p183     Document Type: Article

References (8)

1. Quirk, M.; Serda, J. Semiconductor Manufacturing Technology; Prentice Hall: Upper Saddle River, NJ, 2001.
2. Campbell, D. J.; Beckman, J. K.; Calderon, C. E.; Doolan, P. W.; Ottosen, R. M.; Ellis, A. B.; Lisensky, G. C. J. Chem. Educ. 1999, 76, 537-541.
3. Gwozdz, P. S. IEEE Trans. Educ. 1996, 39, 211-216.
4. Moore, G. E. Electronics 1965, 38, 114-117.
5. Xia, Y.; Whitesides, G. M. Angew. Chem., Int. Ed. Engl 1998, 37, 550-575.
6. Silicon Strategies. http://www.siliconstrategies.com/story/ OEG20010302S0052 (accessed Sept 2002).
7. Bowden, M. J. In Materials for Microlithography; American Chemical Society: Washington, DC, 1984; Vol. 266.
8. Christenson, A. M.; Augustine, B. H. PROC Nat. Conf. Undergrad. Res., Missoula, MT, 2000.