GA-optimized backpropagation neural network with multi-parameterized gradients and applications to predicting plasma etch data

Chemometrics and Intelligent Laboratory Systems

Volumn 79, Issue 1-2, 2005, Pages 123-128

  Kim, Byungwhan ^a   Kim, Sungmo ^a  

^a Sejong University   (South Korea)

Author keywords

Genetic algorithm; Gradients; Model; Neural network; Plasma etching

Indexed keywords

METHANE; SILICON CARBIDE;

ACCURACY; ARTICLE; ARTIFICIAL NEURAL NETWORK; DATA ANALYSIS; FACTORIAL ANALYSIS; GENETIC ALGORITHM; PREDICTION; PRIORITY JOURNAL; STATISTICAL MODEL;

EID: 24044526487     PISSN: 01697439     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.chemolab.2005.06.002     Document Type: Article

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