Control of Particle Generation in CVD Reactor by Ionization of Source Vapor

Kagaku Kogaku Ronbunshu

Volumn 25, Issue 6, 1999, Pages 878-883

  Adachi, Motoaki ^a   Fujimoto, Toshiyuki ^b   Nakaso, Koichi ^b   Kim, Tae Oh ^b   Okuyama, Kikuo ^b  

^a Osaka Prefecture University   (Japan)

^b HIROSHIMA UNIVERSITY   (Japan)

Author keywords

atmospheric pressure chemical vapor deposition; dielectric film; gas phase nucleation; ionization; tetraethoxysilane

Indexed keywords

EID: 24044458278     PISSN: 0386216X     EISSN: 13499203     Source Type: Journal    
DOI: 10.1252/kakoronbunshu.25.878     Document Type: Article

References (11)

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