X-ray photoelectron spectroscopy studies of TixAl1-xN thin films prepared by RF reactive magnetron sputtering

Journal of Materials Science and Technology

Volumn 21, Issue 4, 2005, Pages 541-544

  Xiong, Rui ^a   Shi, Jing ^b  

^a WUHAN UNIVERSITY   (China)

^b INTERNATIONAL CENTRE FOR MATERIALS PHYSICS   (China)

Author keywords

Core electron spectrum; TixAl1 xN films; X ray photoelectron spectroscopy

Indexed keywords

ALUMINUM NITRIDE; MAGNETRON SPUTTERING; MICROSTRUCTURE; PHOTOELECTRON SPECTROSCOPY; TITANIUM NITRIDE; X RAY DIFFRACTION;

CORE-ELECTRON SPECTRUM; HEXAGONAL WURTZITE STRUCTURE; RF REACTIVE MAGNETRON SPUTTERING; TI CONTENT; X-RAY PHOTOELECTRON SPECTROSCOPY;

FILM GROWTH;

EID: 23944526151     PISSN: 10050302     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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