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Volumn 27, Issue 2, 2006, Pages 100-106

On the use of stereolithography built photoelastic models for stress analysis investigations

Author keywords

Epoxy resin; Photoelasticity; Stereolithography; Stress analysis

Indexed keywords

COMPUTER AIDED DESIGN; COMPUTER SIMULATION; EPOXY RESINS; MATHEMATICAL MODELS; NUMERICAL ANALYSIS; PHOTOELASTICITY; RAPID PROTOTYPING;

EID: 23944501998     PISSN: 02613069     EISSN: 18734197     Source Type: Journal    
DOI: 10.1016/j.matdes.2004.09.028     Document Type: Article
Times cited : (33)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.