On the use of stereolithography for the manufacture of photoelastic models

Experimental Mechanics

Volumn 43, Issue 2, 2003, Pages 148-162

  Curtis, J D ^a   Hanna, S D ^b   Patterson, E A ^c   Taroni, M ^d  

^a AIRBUS OPERATIONS LTD   (United Kingdom)

^b 3D Systems   (United States)

^c UNIVERSITY OF SHEFFIELD   (United Kingdom)

^d SNECMA   (France)

Author keywords

Epoxy resin; Mechanical behavior; Photoelasticity; Residual stresses; Stereolithography

Indexed keywords

BIREFRINGENCE; CASTING; FREEZING; LITHOGRAPHY; RESIDUAL STRESSES; THERMOSETS;

STEREOLITHOGRAPHY;

PHOTOELASTICITY;

STRESS; STRUCTURAL COMPONENT;

EID: 0038682816     PISSN: 00144851     EISSN: None     Source Type: Journal    
DOI: 10.1177/0014485103043002005     Document Type: Article

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