Inkjet printing of polymeric field-effect transistors and its applications

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 44, Issue 6 A, 2005, Pages 3649-3658

  Kawase, Takeo ^a   Moriya, Soichi ^a   Newsome, Christopher J ^b   Shimoda, Tatsuya ^a  

^a SEIKO EPSON CORPORATION   (Japan)

^b Cambridge Research Laboratory of Epson   (United Kingdom)

Author keywords

Active matrix backplane; Electrophoretic display; Flexible display; Inkjet printing; Organic field effect transistor; Polymer field effect transistor; Thin film transistor

Indexed keywords

INK; POLYMERS; PRINTING; SEMICONDUCTING POLYMERS; SEMICONDUCTOR MATERIALS; THIN FILM TRANSISTORS;

ACTIVE MATRIX BACKPLANE; ELECTROPHORETIC DISPLAY; FLEXIBLE DISPLAYS; INKJET PRINTING; ORGANIC FIELD-EFFECT TRANSISTORS; POLYMER FIELD-EFFECT TRANSISTORS;

FIELD EFFECT TRANSISTORS;

EID: 23944498560     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.44.3649     Document Type: Article

References (36)

1. F. Ebisawa, T. Kurokawa and S. Nara: J. Appl. Phys. 54 (1983) 3255.
2. A. Tsumura, H. Koezuka and T. Ando: Appl. Phys. Lett. 49 (1986) 1210.
3. A. Assadi, C. Svensson, M. Willander and O. Inganas: Appl. Phys. Lett. 53 (1988) 195.
4. A. Tsumura, H. Fuchigami and H. Koezuka: Synth. Met. 41 (1991) 1181.
5. S. Holdcroft: Adv. Mater. 13 (2001) 1753.
6. H. Sirringhaus, T. Kawase, R. H. Friend, T. Shimoda, M. Inbasekaran, W. Wu and E. P. Woo: Science 290 (2000) 2123.
7. T. Kawase, H. Sirringhaus, R. H. Friend and T. Shimoda: Tech. Dig. IEDM, 2000, p. 623.
8. B.-J. de Gans, P. C. Duineveld and U. S. Schubert: Adv. Mater. 16 (2004) 203.
9. H. Kiguchi, S. Katagami, Y. Yamada, S. Miyashita, H. Aruga, A. Mon, T. Shimoda, R. Kimura, T. Nakamura, Y. Miyamoto and Y. Takeuchi: Tech. Dig. Asia Display IDW'01, 2001, p. 1745.
10. T. R. Hebner, C. C. Wu, D. Marcy, M. H. Lu and J. C. Sturm: Appl. Phys. Lett. 72 (1998) 519.
11. J. Bharathan and Y. Yang: Appl. Phys. Lett. 72 (1998) 2660.
12. T. Shimoda, S. Kanbe, H. Kobayashi, S. Seki, H. Kiguchi, I. Yudasaka, M. Kimura, S. Miyashita, R. H. Friend, J. H. Burroughes and C. R. Towns: SID Dig. Tech. Pap., Vol. 30, 1999, p. 376.
13. H. Kobayashi, S. Kanbe, S. Seki, H. Kigchi, M. Kimura, I. Yudasaka, S. Miyashita, T. Shimoda, C. R. Towns, J. H. Burroughes and R. H. Friend: Synth. Met. 111 (2000) 125.
14. M. Furusawa, T. Hashimoto, M. Ishida, T. Shimoda, H. Hasei, N. Abe, S. Fukuda and K. Betsui: SID Dig. Tech. Pap., Vol. 33, 2002, p. 753.
15. T. Kawase, H. Sirringhaus, R. H. Friend and T. Shimoda: Adv. Mater. 13 (2001) 1601.
16. J. A. Rogers, Z. N. Bao, A. Makhija and P. Braun: Adv. Mater. 11 (1999) 741.
17. J. A. Rogers, Z. N. Bao and V. R. Raju: Appl. Phys. Lett. 72 (1998) 2716.
18. Z. N. Bao, Y. Feng, A. Dodabalapur, V. R. Raju and A. J. Lovinger: Chem. Mater. 9 (1997) 1299.
19. T. Kitahara: Proc. Japan Hardcopy, 2003, p. 217.
20. M. L. Renak, G. C. Bazan and D. Roitman: Adv. Mater. 9 (1997) 392.
21. T. Kawase, T. Shimoda, C. Newsome, H. Sirringhaus and R. H. Friend: Thin Solid Films 438-439 (2003) 279.
22. B. S. Ong, Y. Wu, P. Liu and S. Gardner: J. Am. Chem. Soc. 126 (2003) 3378.
23. S. Moriya, M. Harada, T. Kawase, S. Inoue and T. Shimoda: Ext. Abstr. (64th Fall Meet. 2003); Japan Society of Applied Physics and Related Societies, 1p-YL-7 [in Japanese].
24. C. S. Dulcey, J. H. Geoger, V. Krauthamer, D. A. Stenger, T. L. Fare and J. M. Calvert: Science 252 (1991) 551.
25. A. Kumar, H. A. Biebuyck and G. M. Whitesides: Langmuir 10 (1994) 1498.
26. M. Redecker, D. D. C. Bradley, M. Inbasekaran and E. P. Woo: Appl. Phys. Lett. 74 (1999) 1400.
27. M. Grell, M. Redecker, K. S. Whitehead, D. D. C. Bradley, M. Inbasekaran, E. P. Woo and W. Wu: Liq. Cryst. 26 (1999) 1403.
28. H. Sirringhaus, R. J. Wilson, R. H. Friend, M. Inbasekaran, W. Wu, E. P. Woo, M. Grell and D. D. C. Bradley: Appl. Phys. Lett. 77 (2000) 406.
29. C. J. Newsome, T. Kawase, T. Shimoda and D. J. Brennan: Proc. SPIE 5217 (2003) 16.
30. S. Moriya, H. Harada, S. Kanbe, T. Kawase and T. Shimoda: Ext. Abstr. (66th Fall Meet. 2004); Japan Society of Applied Physics and Related Societies, 2a-ZR-7 [in Japanese].
31. R. D. Deegan, O. Bakajin, T. F. Dupont, G. Huber, S. R. Nagel and T. A. Witten: Nature 389 (1997) 827.
32. Y. Y. Lin, D. J. Gundlach, S. F. Nelson and T. N. Jackson: IEEE Electron Device Lett. 18 (1997) 606.
33. E. Nakamura, H. Kawai, N. Kanae and H. Yamamoto: SID Dig. Tech. Pap., Vol. 29, 1998, p. 1014.
34. P. Drzaic, B. Comiskey, J. D. Albert, L. Zhang, A. Loxley, R. Feeney and J. Jacobson: SID Dig. Tech. Pap., Vol. 29, 1998, p. 1131.
35. T. Kawase, C. J. Newsome, S. Inoue, T. Saeki, H. Kawai, S. Kanbe, T. Shimoda, H. Sirringhaus, D. Machenzie, S. Burns and R. H. Friend: SID Dig. Tech. Pap., Vol. 33, 2002, p. 1017.
36. T. Shimoda and T. Kawase: ISSCC Dig. Tech. Pap., Vol. 47, 2004, p. 286.