Improving the performance of organic field effect transistor by optimizing the gate insulator surface

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 44, Issue 6 A, 2005, Pages 3721-3727

  Zen, Achmad ^a   Neher, Dieter ^a   Silmy, Kamel ^b   Holländer, Andreas ^b   Asawapirom, Udom ^c   Scherf, Ullrich ^c  

^a UNIVERSITY OF POTSDAM   (Germany)

^b FRAUNHOFER INSTITUTE FOR APPLIED POLYMER RESEARCH   (Germany)

^c UNIVERSITY OF WUPPERTAL   (Germany)

Author keywords

Dielectric; Insulator; Organic electronic; Organic field effect transistor; Surface treatment; Thin film transistor

Indexed keywords

CONCENTRATION (PROCESS); OXYGEN; POLYMERS; SEMICONDUCTING ORGANIC COMPOUNDS; X RAY PHOTOELECTRON SPECTROSCOPY;

DIELECTRIC; INSULATORS; ORGANIC ELECTRONICS; ORGANIC FIELD-EFFECT TRANSISTORS; PLASMA TREATMENT; SURFACE TREATMENTS; THIN-FILM TRANSISTORS;

FIELD EFFECT TRANSISTORS;

EID: 23944478836     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.44.3721     Document Type: Article

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