Growth of free-standing diamond films on stainless steel

Plasma Science and Technology

Volumn 7, Issue 4, 2005, Pages 2950-2952

  Man, Weidong ^a,b   Wang, Jianhua ^b   Zhang, Baohua ^b   Bai, Yuming ^c  

^a INSTITUTE OF PLASMA PHYSICS   (China)

^b WUHAN INSTITUTE OF TECHNOLOGY   (China)

^c FOURTH MILITARY MEDICAL UNIVERSITY   (China)

Author keywords

Chemical vapor deposition; Free standing diamond film; Microwave plasma; Stainless steel

Indexed keywords

EID: 23944460872     PISSN: 10090630     EISSN: None     Source Type: Journal    
DOI: 10.1088/1009-0630/7/4/017     Document Type: Article

References (6)

1. Man Weidong, Wang Jianhua, Wang Chuanxin. New Carbon Materials, 2002, 17(1): 62~70 (in Chinese)
2. Man Weidong, Wang Jianhua, Wang Chuanxin. Tool Engineering, 2001, 35(9): 3-7 (in Chinese)
3. Liou Y, Inspektor A, Weimer R, J. Mater. Res., 1990, 5: 2305-2312
4. Fan Qihua, Pereira E. J. Mat. Res., 1998, 13: 2787-2790
5. Neto M A, Fan Qihua, Pereira E. Diamond Rel, Mater., 2001, 10: 316-321
6. Yee A L, Ong H C, Stewart L M. J. Mater. Res., 1997, 12: 1796-1805