Control of nano-step structures on sapphire wafer surface by focused ion beam processing

Journal of the Ceramic Society of Japan

Volumn 113, Issue 1319, 2005, Pages 478-483

  Takeuchi, Atsuko ^a   Kotaki, Toshiro ^a   Koyama, Koji ^a   Sunakawa, Kazuhiko ^a   Yaguchi, Yoichi ^a   Matsui, Yoshinori ^b   Murasugi, Masakazu ^b   Seki, Shu ^b   Tagawa, Seiichi ^b   Hara, Wakana ^c   Yoshimoto, Mamoru ^c  

^a Adamant Namiki Precision Jewel Co Ltd   (Japan)

^b OSAKA UNIVERSITY   (Japan)

^c TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

FIB; Nano dot; Nano step; Off angle; Sapphire wafer

Indexed keywords

ANNEALING; ARRAYS; ION BEAMS; SAPPHIRE; SURFACES;

FOCUSED ION BEAM (FIB); NANO-DOT; NANO-STEP; OFF-ANGLE; SAPPHIRE WAFERS;

NANOSTRUCTURED MATERIALS;

EID: 23844557572     PISSN: 09145400     EISSN: None     Source Type: Journal    
DOI: 10.2109/jcersj.113.478     Document Type: Article

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