Fabrication of semiconductor- and polymer-based photonic crystals using nanoimprint lithography

Technical Physics

Volumn 50, Issue 8, 2005, Pages 1043-1047

  Arakcheeva, E M ^a   Tanklevskaya, E M ^a   Nesterov, S I ^a   Maksimov, M V ^a   Gurevich, S A ^a   Seekamp, J ^b   Sotomayor Torres, C M ^b  

^a IOFFE INSTITUTE   (Russian Federation)

^b UNIVERSITY OF WUPPERTAL   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 23844499369     PISSN: 10637842     EISSN: None     Source Type: Journal    
DOI: 10.1134/1.2014536     Document Type: Article

References (8)

1. H. Kosaka, T. Kawashima, A. Tomita, et al., J. Lightwave Technol. 17, 2032 (1999).
2. H. Kosaka, T. Kawashima, A. Tomita, et al., Appl. Phys. Lett. 74, 1212 (1999).
3. M. Bayindir, E. Ozbay, B. Temelkuran, et al., Phys. Rev. B 63, 81107 (2001).
4. A. Chutinan, M. Mochizuki, M. Imada, et al., Appl. Phys. Lett. 79, 2690 (2001).
5. S. Rennon, F. Klopf, J. P. Reithmaier, et al., Electron. Lett. 37, 690 (2001).
6. M. V. Maximov, E. M. Ramushina, V. I. Skopina, et al., Semicond. Sci. Technol. 17, L69 (2002).
7. C. M. Sotomayor Torres, S. Zankovych, J. Seekamp, et al., Mater. Sci. Eng. 23, 23 (2003).
8. R. J. Shul and S. J. Pearton, Handbook of Advanced Plasma Processing Techniques (Springer, Berlin, 2000).