Kinetic limitations in two-and three-dimensional growth

Materials Research Society Symposium Proceedings

Volumn 849, Issue , 2005, Pages 81-89

  Man, K L ^a   Tang, W X ^a   Huang, Hanchen ^b   Altman, M S ^a  

^a HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Hong Kong)

^b RENSSELAER POLYTECHNIC INSTITUTE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CORNER-CROSSING BARRIER; DIFFUSION LIMITED (DL); SCHWOEBEL-EHRLICH (SE) DIFFUSION BARRIER; THREE-DIMENSIONAL (3D) GROWTH;

BOUNDARY CONDITIONS; DIFFUSION; INTERFACIAL ENERGY; LOW ENERGY ELECTRON DIFFRACTION; NANOSTRUCTURED MATERIALS; SURFACE ACTIVE AGENTS;

CRYSTAL GROWTH;

EID: 23844441240     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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