Morphological studies of nanostructures from directed cluster beam deposition

European Physical Journal D

Volumn 34, Issue 1-3, 2005, Pages 251-254

  Chen, J B ^a,c   Zhou, J F ^b   Hafele A ^c   Yin, C R ^b,c   Kronmuller W ^c   Han, M ^b   Haberland, H ^c  

^a KUNMING UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

^b NANJING UNIVERSITY   (China)

^c UNIVERSITY OF FREIBURG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS CARBON; AMORPHOUS SILICON; ATOMIC FORCE MICROSCOPY; DEPOSITION; MAGNETRONS; TRANSMISSION ELECTRON MICROSCOPY;

CARBON SURFACE; CLUSTER BEAM DEPOSITION; CLUSTER ENERGY; CLUSTER-BASED; INCIDENT ANGLES; MAGNETRON PLASMAS; MORPHOLOGICAL STUDY; SILICON SURFACES; TIN CLUSTERS; TRANSMISSION ELECTRON;

NANOSTRUCTURES;

EID: 23744433317     PISSN: 14346060     EISSN: 14346079     Source Type: Journal    
DOI: 10.1140/epjd/e2005-00153-2     Document Type: Conference Paper

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