Implant process control: Going beyond particles and RS

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 237, Issue 1-2, 2005, Pages 318-323

  Sing, D C ^a   Rendon, M J ^a  

^a FREESCALE SEMICONDUCTOR INC   (United States)

Author keywords

Automatic process control; Charge control; Energy analysis; Fault detection; Ion implantation; Mass analysis

Indexed keywords

COMPUTER SOFTWARE; DATA ACQUISITION; DATABASE SYSTEMS; IMPURITIES; ION IMPLANTATION; SILICON WAFERS;

AUTOMATIC PROCESS CONTROL; CHARGE CONTROL; ENERGY ANALYSIS; FAULT DETECTION; MASS ANALYSIS;

PROCESS CONTROL;

EID: 23444435284     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2005.05.006     Document Type: Conference Paper

References (2)

1. M. Rendon, D.C. Sing, Local Area Network (LAN) Address, in: Manufacturing and Development Implant Tool Issues, 2002, 14th International Conference on Ion Implantation Technology, IEEE, 2003, p. 335.
2. M. Rendon, D.C. Sing, M. Beard, M. Hartig, J. Arnold, in: Ion Implant Data Log Analysis for Process Control and Fault Detection, 2002, 14th International Conference on Ion Implantation Technology, IEEE, 2003, p. 331.