Method study for microlens array with continuous aspherical profile

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5177, Issue , 2003, Pages 133-139

  Du, C L ^a   Dong, X C ^a   Zhou, C X ^a   Liu, Y H ^a   Qiu, C K ^a   Tang, X G ^a   Deng, Q L ^a   Pan, L ^a  

^a INSTITUTE OF OPTICS AND ELECTRONICS   (China)

Author keywords

Aspherical microlens array; Binary mask function; Continuous resist model; Micro relief profile control

Indexed keywords

INDUCTIVELY COUPLED PLASMA; LIGHT SENSITIVE MATERIALS; MASKS; PHOTOLITHOGRAPHY; PHOTOSENSITIVITY; PLASMA ETCHING; SEMICONDUCTOR LASERS;

ASPHERICAL MICROLENS ARRAYS; BINARY MASK FUNCTIONS; CONTINUOUS RESIST MODELS; MICRO RELIEF PROFILE CONTROL;

MICROLENSES;

EID: 2342622137     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.504691     Document Type: Conference Paper

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