Characterization and modeling of tungsten nanoparticles generated by laser-assisted chemical vapor deposition

Journal of Applied Physics

Volumn 95, Issue 8, 2004, Pages 4408-4414

  Landstrom L ^a   Kokavecz, J ^b   Lu, J ^a   Heszler, P ^a,c  

^a UPPSALA UNIVERSITY   (Sweden)

^b UNIVERSITY OF SZEGED   (Hungary)

^c RESEARCH GROUP ON LASER PHYSICS   (Hungary)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; CHEMICAL VAPOR DEPOSITION; CRYSTALLINE MATERIALS; EMISSION SPECTROSCOPY; EVAPORATION; HEAT RADIATION; LASER APPLICATIONS; MELTING; TRANSMISSION ELECTRON MICROSCOPY; TUNGSTEN; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

LASER FLUENCES; LASER-ASSISTED CHEMICAL VAPOR DEPOSITION (LCVD); MICROGRAPHS; OPTICAL EMISSION SPECTROSCOPY (OES);

NANOSTRUCTURED MATERIALS;

EID: 2342595909     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1667596     Document Type: Article

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