Spectroscopic and electrochemical characterisation of thin cathodic plasma polymer films on iron

Applied Surface Science

Volumn 229, Issue 1-4, 2004, Pages 87-96

  Barranco, V ^a   Thiemann, P ^a   Yasuda, H K ^b   Stratmann, M ^a   Grundmeier, G ^a  

^a MAX PLANCK INSTITUT FÜR EISENFORSCHUNG GMBH   (Germany)

^b UNIVERSITY OF MISSOURI   (United States)

Author keywords

Electrochemical impedance spectroscopy; Kelvin probe; Plasma polymer; Thin films; Water uptake

Indexed keywords

ADHESION; CORROSION PROTECTION; DEPOSITION; DIFFUSION; ELECTROCHEMISTRY; INFRARED SPECTROSCOPY; INTERFACES (MATERIALS); IRON; OXIDATION; OXYGEN; PLASMA POLYMERIZATION; POLYMERS; THIN FILMS;

BARRIER PROPERTIES; KELVIN PROBE; PLASMA POLYMERS; WATER UPTAKE;

PLASTIC FILMS;

EID: 2342589380     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2004.01.046     Document Type: Article

References (26)

1. N. Morosoff, in: R. d'Agostino (Ed.), Plasma Deposition, Treatment and Etching of Polymers, pp. 68-84 (Chapter 1).
2. Wang T.F., Lin T.J., et al. Prog. Org. Coat. 28:1996;291-297.
3. van Ooij W.J. J. Test. Eval. 23:1995;33-40.
4. Yasuda H., Wang T.F., et al. Prog. Org. Coat. 30:1997;31-38.
5. Grundmeier G., Stratmann M. Mater. Corros. 49:1998;150-160.
6. van Ooij W.J., Surman D., Yasuda H.K. Prog. Org. Coat. 25:1995;319-337.
7. Grundmeier G., Stratmann M. Appl. Surf. Sci. 141:1999;43-56.
8. Walter G. Corros. Sci. 32:1991;1085.
9. Mansfeld F., Han L.T., Lee C.C., Zhang G. Electrochim. Acta. 43(19-20):1998;2933-2945.
10. van der Weijde D.H., van Westing E.P.M., de Wit J.H.W. Electrochim. Acta. 41(7/8):1996;1103-1107.
11. Kendig M., Mansfeld F., Tsai S. Corros. Sci. 23(4):1983;317-329.
12. Linqvist S.A. Corrosion. 41:1985;69.
13. Deflorian F., Fedrizzi L., Rossi S., Bonora P.L. Electrochim. Acta. 44:1999;4243-4249.
14. Galliano F., Landolt D. Prog. Org. Coat. 44:2002;217-225.
15. Deflorian F., Fedrizzi L., Bonora P.L. Corros. Sci. 38(10):1996;1697.
16. Bonora P.L., Deflorian F., Fedrizzi L. Electrochim. Acta. 41(7/8):1996;1073-1082.
17. Feliu S., Galván J.C., Morcillo M. Prog. Org. Coat. 17(2):1989;143-153.
18. Brasher D.M., Kingsbury A.H. J. Appl. Chem. 4:1954;62.
19. Klages C.-P., Dietz A., Höing T., Thyen R., Weber A., Willich P. Surf. Coat. Technol. 80:1996;121-128.
20. Vautrin-Ul Ch., Roux F., Boisse-Laporte C., Pastol J.L., Chausse A. J. Mater. Chem. 12:2002;2318-2324.
21. Domingues L., Oliveira C., Fernandes J.C.S., Ferreira M.G.S. Electrochim. Acta. 47:2002;2253-2258.
22. van der Weijde D.H., van Westing E.P.M., de Wit J.H.W. Corros. Sci. 36(4):1994;643-652.
23. V. Barranco, J. Carpentier, G. Grundmeier, Electrochim. Acta, 2003, in press.
24. Niikura C., Kim S., Drévillon B., Poissant Y., Roca i Cabarrocas P., Bourée J. Thin Solid Films. 395:2001;178-183.
25. Weikart C.M., Miyama M., Yasuda H.K. J. Colloid Interface Sci. 211:1999;28-38.
26. Shirtcliffe N., Thiemann P., Stratmann M., Grundmeier G. Surf. Coat. Technol. 142-144:2001;1121-1128.