The effect of thickness on the properties of heavily Al-doped ZnO films by simultaneous rf and dc magnetron sputtering

Ceramics International

Volumn 30, Issue 4, 2004, Pages 497-501

  Lin, Su Shia ^a   Huang, Jow Lay ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

D. ZnO; Resistivity; Surface morphology; Thickness; Transmission

Indexed keywords

ALUMINUM; CARRIER MOBILITY; CRYSTALLINE MATERIALS; DOPING (ADDITIVES); ELECTRIC CONDUCTIVITY; MAGNETRON SPUTTERING; MORPHOLOGY; SURFACE ROUGHNESS; ULTRAVIOLET RADIATION; ZINC OXIDE;

FILM DEPOSITION; FILM THICKNESS; RESISTIVITY; TRANSMISSION;

CERAMIC MATERIALS;

EID: 2342545496     PISSN: 02728842     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ceramint.2003.08.002     Document Type: Article

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