A 1480/1064 nm dual wavelength photo-thermal etching system for non-contact three-dimensional microstructure generation into agar microculture chip

Sensors and Actuators, B: Chemical

Volumn 100, Issue 3, 2004, Pages 455-462

  Hattori, Akihiro ^a,b   Moriguhi, Hiroyuki ^b   Ishiwata, Shin'ichi ^c   Yasuda, Kenji ^b  

^a System Products Division   (Japan)

^b UNIVERSITY OF TOKYO   (Japan)

^c WASEDA UNIVERSITY   (Japan)

Author keywords

1480 1064 nm infrared focused beam; Agar microchamber; Dual wavelength photo thermal etching; Flexible change of structure

Indexed keywords

CELL CULTURE; CHROMIUM; ETCHING; INFRARED RADIATION; LASERS; MELTING; MICROSTRUCTURE; WATER;

1480/1064 NM INFRARED FOCUSED BEAMS; AGAR MICROCHAMBERS; DUAL WAVELENGTH PHOTO-THERMAL ETCHING; FLEXIBLE CHANGE OF STRUCTURES;

SENSORS;

EID: 2342515407     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.snb.2003.11.041     Document Type: Article

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